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Ninomiya System Brush Cleaning Device
We contribute to enhancing our customers' added value by utilizing advanced fine processing technology for development and etching, as well as advanced thin plate transportation technology.
Brushing is important for dirt that cannot be removed by water pressure. We clean the dirt thoroughly to the corners with nylon brushes of different diameters.
■Ease of use that feels more like a tool than a machine ●It is safe to touch the rotating brush directly ●Space-saving and cost-effective with casters for easy mobility ●Special nylon brushes selected from years of experience ●Brush replacement is easy (when equipped with fittings) ●Replacement period is 3 to 12 months ●Brush heat resistance temperature is below 60°C.
It is a device that cleans the surface and back of the wafer with a brush at the same time.
By combining with two-fluid cleaning, it is possible to remove strong adherents and fine particles. It is mainly used for cleaning after CMP. Example of equipment configuration: Loader ⇒ 1. Brush cleaning chamber ⇒ 2. Rinse drying chamber ⇒ Unloader 1. Brush cleaning chamber ⇒ Chemical shower → Double-sided brush cleaning → Pure water rinse 2. Rinse drying chamber ⇒ Two-fluid (N2 + pure) cleaning → MS shower (optional) → N2 blow drying
